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Plasma
An ionized gas used for flat panel displays.
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ICP-OES Analyzer
ARCOS
SPECTRO Analytical Instruments GmbH
For the most demanding elemental analyses in industry and research. ARCOS analyzer represents a new pinnacle of productivity and performance for inductively coupled plasma optical emission spectrometers. SPECTRO ARCOS excels in industrial and academic applications for the most advanced elemental analysis of metals, chemicals, petrochemicals, and other materials.
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Inductively Coupled Plasma Spectrometry
Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Elite™ 13.56 MHz RF Plasma Generators
The elite™ Series of RF plasma generators provides state-of-the art technology in a compact air-cooled package. The elite is designed with high speed closed loop control, a class E RF deck and a switching modulator for superior output performance. The elite design utilizes a single printed circuit board assembly for the full rack product virtually eliminating all internal wires and connectors and thereby providing the highest reliability available.
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Matching Network Solution
Navio
Experience simplicity and high reliability in a single, affordable package. The Navio™ matching network leverages our power expertise to precisely match complex plasma impedance to your tuning range. It’s quick, accurate, and repeatable. Available in multiple power ranges and frequencies, choose from a standard offering or a configurable design. Installation is virtually plug-and-play with Advanced Energy’s RF power supplies. Virtual Front Panel software is available for monitoring.
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High Sensitive Radiometers for Plasma Diagnostics
ELVA-1 radiometers for plasma diagnostic are worldwide known product. The custom designed ECE radiometers have been installed at lots of Tokamaks
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Remote Plasma Source
MAXstream
Advanced Energy’s MAXstreamTM line is the next generation of remote plasma sources for chamber cleaning. The MAXstream is available in 3, 6, 8, 10, and 12 SLPM NF3 flow rates to optimize price and performance.
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High Power Microwave Plasma System
The High Power Microwave Plasma System features the High Power Microwave Plasma Source, generator (with isolator) and auto-tuning system comprised of the Precision Power Detector and SmartMatch® unit. This comprehensive system delivers a high concentration of radicals with low electron temperatures for the highest dissociation and lowest recombination rates.
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Digital Dairy Refractometer, Colostrum and Blood Plasma Protein
DD-2
The DD-2 Digital-Dairy Refractometer will provide reliable estimates of the percent solids in waste milk and colostrum quality using the Brix Method, and a blood serum total protein concentration scale can be used to assess failure of passive transfer. The MISCO Digital-Dairy™ refractometers are specifically designed to help professional dairy farmers and calf ranchers to rear healthy calves. They are rugged enough to withstand the demands of farm use, yet precise enough to give laboratory-quality readings.
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Inductively Coupled Plasma
Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Plasma Processing Systems
PlasmaSTAR
The PlasmaSTAR® Series of Plasma Processing Systems from Axic, Inc. defines a new concept in barrel plasma processing. The systems are based on a modular design concept. Starting with a universal base unit, multiple electrode modules are available for easy insertion into the base unit. You will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma.
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Plasma Profiling TOFMS
PP-TOFMS
Plasma Profiling TOFMS addresses the needs of materials scientists across a wide range of application areas. PP-TOFMS provides fast elemental depth distribution of any inorganic material. The speed and ease of use of PP-TOFMS permit to reduce optimization time of growth processes as many research scientists strive to reduce the time from discovery to applications of new materials.The simultaneous full coverage of TOFMS available for each point of depth permits the detection of non suspected contamination. This is key for failure analysis and optimization of thin film processes that tend to no longer be based on ultra-high grade methods (i.e. ink jet printing…).
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Long Focal Length Spectrometer
1000M Series
The M Series II monochromators are the large focal length monochromators of choice for the most demanding spectroscopy applications such as Raman, Plasma Emission, LIBS and others. With a spectral resolution down to 0.006 nm and an optional dual automated entrance and exit ports, the M Series II monochromators are the most versatile spectrometers in their market space. These monochromators also benefit from the highest quality of gratings, also designed and manufactured by HORIBA. The M Series is the ultimate spectrometer for ultra-high spectral resolution down to 0.006 nm.
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Ideal Remote Plasma Source For Oxygen-Based Processes
Rapid OX
Reduce recombination effects and extend the lifetime of oxygen radicals thanks to Rapid OX's removable quartz liner. When compared to anodized chambers, the resultant reactive species extended lifetime improves photoresist strip rates. And because the quartz liner is easily installed or removed by the operator, it decreases downtime and significantly lowers replacement costs.
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Optical Emission Spectrometry
Involves applying electrical energy in the form of spark generated between an electrode and a metal sample, whereby the vaporized atoms are brought to a high energy state within a so-called "discharge plasma".
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High-Power Density
Apex
The versatile Apex® family of RF generators and power-delivery systems showcases a compact, modular design suitable for chamber mounting. Utilizing sophisticated RF-conversion technology, Apex RF generators and power-delivery systems offer enhanced product and process reliability. High-density power capabilities make them ideal for advanced plasma processes. And various communications models and configurable features allow you to customize your platform and explore integration approaches. No custom generator lead times are necessary.
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R*evolution® Remote Plasma Source
The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
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Multichamber Plasma CVD & RIE Processing Systems
Model MPS-2000
Accurate linear wafer transporter with low particulate generation. Automated options with programmable controls. Safety interlocked with local and global interfaces. Base pressures to 10-8 torr. Optional clean room load lock entry port. Option for inductively coupled plasma processing is available. Complete and ready to operate.
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ICP-OES Spectrometers
ICP-OES spectrometers measure the concentration of elements from ppb to % using de-excitation of atoms and ions in a plasma. The robustness of our Ultima ICP spectrometers makes them ideal for applications common to mining, chemicals manufacture, salt production, wear metals in oil analysis, petrochemical, metallurgical production and precious metal refining.
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Inductively Coupled Plasma Emission Spectroscopy
Inductively Coupled Plasma Emission Spectroscopy
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Pull Off Adhesion Tester
106
Applications for the Elcometer 106 Adhesion Test include paint or plasma spray on bridge decking, coatings on steel, aluminium, concrete etc.Supplied in a carry case - ideal for site testsHand operated - no need for a power supplyIncludes a cutter for EN13144 and ISO 4624 tests
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Spectrometers, Vacuum
A compact and versatile vacuum ultraviolet monochromator. A selection of aberration-corrected diffraction gratings is available so you can tailor the instrument to your wavelength of interest and application. Connect this instrument directly to your vacuum plasma physics experiment or build an intense UV tunable source. It is available as a scanning monochromator, as a spectrometer, or as a spectrograph with microchannel plate or direct-detection CCD. The Model 234/302 is popular in systems due to its compact design, high throughput and resolution. It is also available with an additional entrance or exit port.
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Plasma CVD & Etching Systems
MODEL DRIE-1000
A High Quality Plasma Deposition & Etch System, Ideal for R&D and Small Scale Production. Modified designs with capabilities of 12" wafers. Substrate heating to 500 C. Top loading / Optional loadlock. Multifunctional plasma network. Diversified pumping configurations. Variable electrode spacing. Customized features and components for specific applications.
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UV Plasma Sources
UVS300|UVS 10/35
The UVS300 and UVS 10/35 are UV Plasma sources with high intensity, working with different gases.
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ICP-OES Analyzer
SPECTRO ARCOS
SPECTRO Analytical Instruments GmbH
The SPECTRO ARCOS ICP-OES excels in industrial and academic applications for the most advanced elemental analysis of metals, chemicals, petrochemicals, and other materials.Its unique new MultiView plasma interface option provides truly uncompromising axial-view and radial-view plasma observation in a single instrument. The periscope-free MultiView mechanism lets an operator literally "turn" a radial-view instrument into an axial-view device, or vice-versa, in 90 seconds or less. Visit the MultiView Q&A section in the ARCOS Resource Center for answers to frequently asked questions. Plasma power enters a whole new era with the system's innovative generator. This unique, compact and extremely rugged component is based on laterally diffused metal oxide semiconductor (LDMOS) technology. It delivers the highest plasma power available today, enabling previously impossible feats of analysis at the highest plasma loads.
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Post Dicing
Camtek offers dedicated inspection and metrology solutions for dicing-related processes, ensuring the reliability of the end product. Camtek developed new capabilities to address new dicing technologies such as Stealth and Plasma dicing using new algorithmic and technologies such as Back Light illumination, as well as various handling solutions.
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Plasma Emission Controller
RU-1000
The optical technology developed by HORIBA and the gas control technology offered by HORIBA STEC have been combined to make further advances in plasma control technology. The plasma emission controller RU-100 offers; faster deposition by controlling the transition region, optimized distribution in a large-area, high-capacity chamber, plasma stabilization in a long sputtering process (stable deposition), and mixture optimization of compounds for reactive sputtering.
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Remote Plasma Sources For Process Applications
MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
