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Automated Front & Backside Mask Aligner System
Model 6000
With over 4 decades of manufacturing in the semiconductor industry, OAI meets the growing challenge of a dynamic market with an elite class of production photolithography equipment. Built on the proven OAI modular platform, the Model 6000 has front and backside alignment that is fully automated with a submicron printing capability as well as submicron top to bottom front side alignment accuracy which delivers performance that is unmatched at any price. Choose either topside or optional backside alignment which uses OAI’s customized advanced recognition pattern software. These Mask Aligners have OAI’s Advanced Beam Optics with better than ±3% uniformity and a throughput of 200 wafers per hour in first mask mode, which results in higher yields. The Series 6000 can handle a wide variety of wafers from thick and bonded substrates (up to 7000 microns), warped wafers (up to 7 mm-10mm), thin substrates (down to 100 micron thick), and thick photo resist.
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Tabletop Front & Backside Mask Aligner
Model 200IR
The OAI Model 200IR Mask Aligner is a tabletop system that requires minimal clean room space. It is a cost-effective alternative for R&D or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The Model 200IR Mask Aligner is capable of one micron resolution and alignment precision. It has an alignment module which features mask insert sets and quick-change wafer chucks that enable the use of a variety of substrates and masks without requiring tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and z-axis.
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Large Substrate Mask Aligner
Model 6020
The Model 6020 is a large substrate Production Mask Aligner or Auto-flood Exposure System for RDL First Level Advanced Packaging (PLP) and markets requiring exposure of large glass panels. It is engineered with OAI’s precision, reliability, and quality that is found in all of OAI’s products. The features include wedge effect leveling, superb process repeatability, ≤ 2.0µm printing resolution, and remote diagnostics. Using robotic handling, the system can stand alone or be fully integrated with photo resist processing.
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Tabletop Mask Aligner
Model 200
The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography capital equipment industry. The Model 200 is a tableop mask Aligner that requires minimal cleanroom space. It offers an economic alternative for R&D, or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.
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MRM(Mask)
MRM Series
- Fully automated system that can produce masks by automating the mask production process such as fabric supply, molding, cutting, and bonding.
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PHOTO COUPLER TESTER
May be linked to machine handler for automatic test on production line.Test items include：VF、IR、Vceo、Iceo、Vsat、CTR
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DUV Mask Aligner
Model 200E
OAI’S Model 200E DUV Mask Aligner performs all the functions of the tabletop Model 200 Mask Aligner but utilizes a 185nm Excimer Lamp as the UV light source. It is used for Biotechnology Processing.
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Traffic Photo Enforcement
LidarCam 2
Automatically collect a video + multiple high-resolution photos every time you capture a traffic violation. Built-in Automated License Plate Recognition (ANPR/ALPR) Technology can automatically check for wanted plates or other violations. Hand-held or mounted to a tripod, in a patrol vehicle or from the side of the road, the Stalker LidarCam 2 is the next generation of photo enforcement.
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Photo Detectors
Vishay has the broadest portfolio of PIN photobodies on the market. Vishay's photo detectors, photo transistors, and light detectors offer lower capacitance, provide high-speed response, and low noise and low dark current along with excellent sensitivity. They are ideal for high-speed data transfer, light barriers, alarm systems, and linear light measurement.
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Mask Flatness Measurement System
Tropel® UltraFlatTM 200 Mask System
The Tropel® UltraFlatTM 200 Mask System was designed specifically for the photomask industry. It delivers the lowest measurement uncertainty for ever-tightening mask flatness specifications. Shrinking device features require not only flatter wafers, but flatter masks.
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Reticle / Mask Particle Detection System
PR-PD2HR
In semiconductor plants, where high performance and demanding functionality are required, the HORIBA PD Series'' high operating rate and long-term dependability have earned it a solid reputation. Inheriting a transfer system that has proven to provide stable, high performance and superior throughput over long operating periods, the PR-PD2HR now offers the most sensitive detection in the series with exclusive signal processing that can detect particles as small as 0.35 m.
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Medical Face Masks Flammability Tester
Sataton Instruments Technology CO., Ltd
Medical face masks flammability tester is to determine the fire resistance performance of medical face masks and full face masks. The tester can provide a specific flame and make the dummy head with facepiece move to the flame under a specific speed. The operator can observe the effects of the flame on the masks and facepiece. The tester is suitable for medical face mask, respiratory protective equipment and full face masks.
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Masks Bacterial Filtration Efficiency Tester
Sataton Instruments Technology CO., Ltd
Face Masks bacterial filtration efficiency BFE tester is to determine the bacterial filtration efficiency (BFE) of medical face mask materials by employing a ratio of the upstream bacterial challenge to downstream residual concentration of the tested medical face mask materials. The tester provides certain flow rate of bacterial aerosol. The operator can measure the number of colony forming units passing through the medical face mask material, which is clamped between a six-stage Anderson cascade impactor and an aerosol chamber, expressed as a percentage of the number of colony forming units present in the challenge aerosol.
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Photo Gate Logger Sensor
NUL-209
This sensor can be used to study various kinds of motion. With six modes of operation, time, velocity or acceleration can be measured with one or two photo gates and associated timing cards, as well as showing pictorially the status (digital 1 or 0) of the voltage output of the photo gate as timing cards pass through it.
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Masks Particle Filtration Efficiency Tester
Sataton Instruments Technology CO., Ltd
Face masks particle filtration efficiency (BFE) tester is device to determine the particle filter penetration and filtration efficiency for respiratory protective devices and face masks. The tester with particle generator can provide sodium chloride particles and paraffin oil particles. It can measure the particle penetration, filtering efficiency and the breathing resistance delta P. It is widely used in quality control, research and development, certification, manufacturing or testing industry, etc.
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MASK DR-SEM
Our defect review SEM tools perform detailed reviews of minute defects on photomasks.
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Photo Detector Testing
With the rise of 5G technology and popularization mobile devices, more and more advanced photoelectric sensors are used in our daily lives. In order to be better applied to mobile devices, the photosensitive area of these advanced photodetector is getting smaller and smaller. However, these applications place higher and higher requirements on the light sensing performance of advanced photodetectors. In the process of shrinking the photosensitive area, it also brings the challenge of accurate measurement of quantum efficiency. Enlitech adopts the spatial light homogenizing technology and follows the ASTM standard “Irradiance Mode” test method, which is proven that it can accurately perform quantum efficiency and other key parameter measurements of advanced photodetectors.
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Front & Backside, Semi-Automatic Mask Aligner
Model 800E
The OAI Model 800E front and backside, semi-automatic mask aligner system offers advanced features and specifications found most often in costly automated production mask aligners. With the development of this mask aligner, OAI meets the growing challenge of the dynamic semiconductor and MEMS market with a new class of mask aligners that are engineered for R&D and low volume production.
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MASK MVM-SEM® E3600 Series
E3630
Together with the miniaturization of semiconductors, high-accurate and stable measurement and evaluation is needed for circuit patterns such as mask patterns and holes. Advantest's E3600 series are used by a wide variety of companies, from semiconductor manufacturers to photomask makers to device and materials producers.
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NanoLattice Pitch Standard for Mask Handling Tools (NLSM)
The NanoLattice™ (NLSM) 100 nm pitch standard utilizes gratings with near perfect periodicity to calibrate magnification and scan linearity of CD-SEM and Atomic Force Microscopes (AFM). Make the grade, with the only pitch standard of its kind available below the 130 nm node.
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MASK MVM-SEM® E3600 Series
E3650
Amid the progress of multiple-exposure technology, and the development of finer-pitch and more complicated circuits, as well as increases in the number of masks and the number of measurement points on each mask, the size of wiring patterns formed on photomasks needs to be measured and evaluated stably with high precision. Advantest’s E3600 series meets the needs of state-of-the-art devices with high measurement repeatability and stable throughput.
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Masks Respiratory Resistance Tester
WKS-1200
WKS-1200 Masks Respiratory Resistance Tester applies to determining the inhalation resistance and exhalation resistance of respirators and mask protective products under specified conditions, and used for the relevant testing and inspection of ordinary mask products by the national labor protection equipment inspection agency or manufacturer.
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Medical Mask Gas Exchange Pressure Difference Tester
DRK371
Shandong Drick Instruments Co., Ltd.
It is used to measure the gas exchange pressure difference of medical surgical masks and other products.
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Medical Masks Synthetic Blood Penetration Tester
WKS-8010
WKS-8010 Medical Masks Synthetic Blood Penetration Tester is to test the mask material with synthetic blood under continuous pressure, and visually inspect the penetration of synthetic blood on the material. It is suitable for the resistance of masks to the penetration of synthetic blood under different levels of test pressure.
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Medical Masks Flammability Tester
TF361
TESTEX Testing Equipment Systems Ltd.
Medical Masks Flammability Tester is used to test the flammability of medical masks, to ensure the safety of masks to wear in. Medical Masks Flammability test Chamber complies with EN 149, GB 2626, GB 19083.
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Medical Mask Gas Exchange Pressure Difference Tester
DRK371-II
Shandong Drick Instruments Co., Ltd.
It is used to measure the gas exchange pressure difference of medical surgical masks and other products.
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Phase Masks
Phase masks are the production tool used to write gratings in fibers and waveguides. Ibsen Phase masks incorporate unbeatable, interferometric (holographic) patterning technology into a production friendly Phase mask.
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